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International Workshop on
DIELECTRIC THIN FILMS FOR FUTURE ULSI DEVICES: SCIENCE AND TECHNOLOGY
Technical Program
Remark:
The presenter of each paper is marked with "
*
".
Technical Program: Separated version
One Page (Not Separated) version
Author Index:
HERE
Session Schedule
Wednesday, November 5, 2008
Opening Address
10:10 - 10:15
K Keynote Speech
10:15 - 12:15
Lunch
12:15 - 13:20
S1 High-k/Metal Gate -1
13:20 - 14:50
Coffee Break
14:50 - 15:10
S2 High-k Memory
15:10 - 16:20
Break
16:20 - 16:30
G1 Poster Shotgun -1
16:30 - 17:20
P1 Poster Presentation -1
17:30 - 18:50
Banquet
19:00 - 21:00
Thursday, November 6, 2008
S3 Characterization
9:00 - 10:30
Coffee Break
10:30 - 10:50
S4 High-k/Metal Gate -2
10:50 - 12:20
Lunch
12:20 - 13:40
S5 High Mobility Channel
13:40 - 15:30
Break
15:30 - 15:40
G2 Poster Shotgun -2
15:40 - 16:40
P2 Poster Presentation -2
16:50 - 18:50
Friday, November 7, 2008
S6 Reliability
9:00 - 10:10
Coffee Break
10:10 - 10:30
S7 Modeling and Simulations / Oxide Growth
10:30 - 12:20
Lunch
12:20 - 13:40
S8 Resistive RAM
13:40 - 14:50
Coffee Break
14:50 - 15:10
S9 High-k/Metal Gate -3
15:10 - 16:40
Closing Remarks and Awarding Ceremony
16:40 - 17:00