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International Workshop on
DIELECTRIC THIN FILMS FOR FUTURE ULSI DEVICES: SCIENCE AND TECHNOLOGY

Session K  Keynote Speech
Time: 10:15 - 12:15 Wednesday, November 5, 2008
Chairs: Shigeaki Zaima (Nagoya Univ., Japan), Jiro Yugami (Renesas, Japan)

K-1 (Time: 10:15 - 11:15)
Title(Keynote Address) Industrialization of Nanoelectronics
Author*Hisatsune Watanabe (Selete, Japan)
Pagep. 1

K-2 (Time: 11:15 - 12:15)
Title(Keynote Address) Integration of Dual Work Function CMOS using Doped High-K Dielectric and Metal Gates to Achieve Improved Power-Performance
Author*Serge Biesemans (IMEC, Belgium)
Pagepp. 3 - 4