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2015 International Workshop on
DIELECTRIC THIN FILMS FOR FUTURE ELECTRON DEVICES: SCIENCE AND TECHNOLOGY
Technical Program

Remark: The presenter of each paper is marked with "*".
Technical Program:   Separated version       One Page (Not Separated) version
Author Index:   HERE

Session Schedule


Monday, November 2, 2015

Opening Address
13:00 - 13:10
K1  Keynote 1
13:10 - 14:10
S1  High-k Gate Stack and Materials
14:10 - 15:20
Coffee Break
15:20 - 15:40
L  Special Lecture
15:40 - 16:20
G  Poster Shotgun
16:20 - 16:50
P  Poster Session
16:50 - 18:50

Tuesday, November 3, 2015

K2  Keynote 2
9:00 - 9:40
Break
9:40 - 10:00
S2  Memory Materials and Devices
10:00 - 11:30
Lunch
11:30 - 13:00
S3  Process and Evaluation for New Channel Materials
13:00 - 15:00
Coffee Break
15:00 - 15:20
S4  Power Device and Characterization
15:20 - 17:30
Break
17:30 - 17:45
Banquet
17:45 - 20:00

Wednesday, November 4, 2015

S5  Interface Control and Reliability for Devices
9:00 - 10:50
Break
10:50 - 11:10
S6  Steep Slope FET
11:10 - 12:30
Lunch
12:30 - 14:00
S7  New Channel Materials
14:00 - 15:40
Coffee Break
15:40 - 16:00
S8  Exotic Materials and Devices
16:00 - 17:10
Closing Remarks
17:10 - 17:30