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2015 International Workshop on
DIELECTRIC THIN FILMS FOR FUTURE ELECTRON DEVICES: SCIENCE AND TECHNOLOGY
Session L
Special Lecture
Time: 15:40 - 16:20 Monday, November 2, 2015
Chair: Yukiharu Uraoka (NAIST, Japan)
L-1
(Time: 15:40 - 16:20)
Title
(Special Lecture)
Technical Advancements and Scientific Impacts of HfO
2
Gate Stacks
Author
*
Akira Toriumi (Univ. of Tokyo, Japan)
Page
pp. 11 - 12