Title | On the Need for a New Model: Inconsistencies between Observations and Physical Model for Random Telegraph Noise in HKMG MOSFET |
Author | *Naoki Tega (Hitachi, Japan), Hiroshi Miki (Hitachi America, U.S.A.), Zhibin Ren, Christopher P. D'Emic, Yu Zhu, David J. Frank, Jin Cai, Michael A. Guillorn, Dae-gyu Park, Wilfried Haensch (IBM, U.S.A.), Kazuyoshi Torii (Hitachi, Japan) |
Page | pp. 153 - 154 |
Title | Dependence of Reliability and Low Frequency Noise on Channel Stress in Nano-Scale NMOSFETs |
Author | *Jung-Deuk Bok, In-Shik Han, Hyuk-Min Kwon, Sang-Uk Park, Yi-Jung Jung, Hong-Shik Shin, Se-Kyung Oh, Ga-Won Lee, Hi-Deok Lee (Chungnam National Univ., Republic of Korea) |
Page | pp. 155 - 156 |
Title | Influence of Gate-first Process on Low-frequency Noise in EOT-scaling of Poly-Si/TiN/HfO2/SiO2 Gate-stack MOSFETs |
Author | *Takeo Matsuki, Ranga Hettiarachchi, Wei Feng (Waseda Univ., Japan), Kenji Shiraishi, Keisaku Yamada, Kenji Ohmori (Univ. of Tsukuba, Japan) |
Page | pp. 157 - 158 |
Title | Effect of Nitrogen Concentration on Low Frequency Noise Characteristics of PMOSFETs with Nitrided Gate Oxide |
Author | *In-Shik Han, Hyuk-Min Kwon, Sang-Uk Park, Jung-Deuk Bok, Yi-Jung Jung, Young Goo Kim (Chungnam National Univ., Republic of Korea), Hee Hwan Ji, Byoung-Seok Park, Soon-Wook Kim, Kyung-Min Kim, Min-Gyu Lim, Yi-Sun Chung, Jung-Hwan Lee (MagnaChip Semiconductor Ltd, Republic of Korea), Ga-Won Lee, Hi-Deok Lee (Chungnam National Univ., Republic of Korea) |
Page | pp. 159 - 160 |