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International Workshop on
DIELECTRIC THIN FILMS FOR FUTURE ELECTRON DEVICES: SCIENCE AND TECHNOLOGY
Session K2
Keynote Speech (II)
Time: 17:05 - 17:55 Friday, January 21, 2011
K2-1
(Time: 17:05 - 17:55)
Title
(Keynote Address)
Technological Challenges in SiC MOS Devices
Author
*
Hiroyuki Matsunami (JST Innovation Plaza, Japan)
Page
pp. 169 - 171