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2013 International Workshop on
DIELECTRIC THIN FILMS FOR FUTURE ELECTRON DEVICES: SCIENCE AND TECHNOLOGY

Session S5  Graphene & Carbon Materials
Time: 9:00 - 10:30 Saturday, November 9, 2013
Chair: Eisuke Tokumitsu (JAIST, Japan)

S5-1 (Time: 9:00 - 9:30)
Title(Invited Paper) Semiconducting Property in Atomically Thin Films for Future Nano-Electronics
Author*Kazuhito Tsukagoshi (NIMS, Japan)
Pagepp. 115 - 116

S5-2 (Time: 9:30 - 9:50)
TitleInterfacial Defects at Top Gate Graphene FETs Investigated Using a Novel Discharging Current Measurement Method
Author*Ukjin Jung, Jaeeun Lee, Young Gon Lee, Jin Ju Kim, Younghun Kim, Byoung Hun Lee (Gwangju Inst. of Science and Tech., Republic of Korea)
Pagepp. 117 - 118

S5-3 (Time: 9:50 - 10:10)
TitleHighly Sensitive Al2O3 Passivated CVD Graphene Photodetectors for UV to IR Region
Author*Chang Goo Kang, Sun-Hee Choe, Sang Kyung Lee, Ukjin Jung, Woojin Park, Young Gon Lee, Tae Jin Yoo, Byoung Hun Lee (Gwangju Inst. of Science and Tech., Republic of Korea)
Pagepp. 119 - 120

S5-4 (Time: 10:10 - 10:30)
TitleTuning of the Dielectric Constant of Diamond-Like Carbon Films Synthesized by Photoemission-Assisted Plasma-Enhanced CVD
Author*Hiroyuki Hayashi, Susumu Takabayashi, Meng Yang, Radek Jesko, Shuichi Ogawa, Taiichi Otsuji, Yuji Takakuwa (Tohoku Univ., Japan)
Pagepp. 121 - 122