Title | (Invited Paper) Evaluation of Traps in the 4H-SiC/SiO2 Interface |
Author | *Tetsuo Hatakeyama, Mitsuru Sometani, Kenji Fukuda, Hajime Okumura (AIST, Japan), Tsunenobu Kimoto (Kyoto Univ., Japan) |
Page | pp. 105 - 106 |
Title | Understanding of Growth Kinetics and Microscopic Structures of Nanometer-Thick Thermal Oxides on 4H-SiC |
Author | Richard Heihachiro Kikuchi, Hirohisa Hirai (Univ. of Tokyo, Japan), *Koji Kita (Univ. of Tokyo/JST-PRESTO, Japan) |
Page | pp. 107 - 108 |
Title | Carpet-Bombing-Like Concaves on SiC MOS Capacitors Formed by Dielectric Breakdown |
Author | *Soshi Sato (Tohoku Univ., Japan), Yuki Hiroi, Kikuo Yamabe (Univ. of Tsukuba, Japan), Makoto Kitabatake (R&D Partnership for Future Power Electronics Technology, Japan), Tetsuo Endoh, Masaaki Niwa (Tohoku Univ., Japan) |
Page | pp. 109 - 110 |
Title | Detection of Oxidation-Induced Compressive Stress in Si(100) Substrate Near the SiO2/Si Interface by X-Ray Photoelectron Spectroscopy |
Author | *Hiroshi Nohira (Tokyo City Univ., Japan), T. Suwa (Tohoku Univ., Japan), K. Nagata (Meiji Univ., Japan), K. Nakajima (Kyoto Univ., Japan), A. Teramoto (Tohoku Univ., Japan), A. Ogura (Meiji Univ., Japan), K. Kimura (Kyoto Univ., Japan), T. Muro, T. Kinoshita (Japan Synchrotron Radiation Research Institute (JASRI), Japan), S. Sugawa, T. Hattori, T. Ohmi (Tohoku Univ., Japan) |
Page | pp. 111 - 112 |
Title | Characterization of Ultra-Thin Dielectric Using Time Domain Reflectometry |
Author | *Yonghun Kim (Gwangju Inst. of Science and Tech., Republic of Korea), Seung-heon Baek, Changhoon Jeon (Korea Advanced Institue of Science and Technology (KAIST), Republic of Korea), Young Gon Lee, JinJu Kim, Ukjin Jung (Gwangju Inst. of Science and Tech., Republic of Korea), Seok Hee Lee (Korea Advanced Institue of Science and Technology (KAIST), Republic of Korea), Byoung Hun Lee (Gwangju Inst. of Science and Tech., Republic of Korea) |
Page | pp. 113 - 114 |