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2006 International Workshop on Dielectric Thin Films for Future ULSI Devices

Session S1 High-Mobility
Time: 13:20 - 14:30 Wednesday, November 8, 2006
Chairs: Yoshinari Kamakura (Osaka Univ., Japan), Byung Jin Cho (National Univ. of Singapore, Singapore)

S1-1 (Time: 13:20 - 13:50)
Title(Invited Paper) The quest for III-V MOSFET's
AuthorMinghwei Hong, J. Raynien Kwo (National Tsing Hua Univ., Taiwan)
Pagepp. 5 - 6

S1-2 (Time: 13:50 - 14:10)
TitleRemote Phonon Scattering in Si and Ge with SiO2 and HfO2 Insulators: Does the Electron Mobility Determine Short Channel Performance?
AuthorTerrance O'Regan, Massimo Fischetti (Univ. of Massachusetts - Amherst, United States)
Pagepp. 7 - 8

S1-3 (Time: 14:10 - 14:30)
TitleImpact of Gate Metal Induced Stress on Performance Enhancement in Gate-Last MOSFETs
AuthorTakeo Matsuki, Seiji Inumiya, Takahisa Eimori, Yasuo Nara (Selete, Japan)
Pagepp. 9 - 10