2006 International Workshop on Dielectric Thin Films for Future ULSI Devices Technical Program

2006 International Workshop on Dielectric Thin Films for Future ULSI Devices

Session K Keynote Speech
Time: 10:15 - 12:15 Wednesday, November 8, 2006
Chairs: Kikuo Yamabe (Univ. of Tsukuba, Japan), Akira Toriumi (Univ. of Tokyo, Japan)

K-1 (Time: 10:15 - 11:15)

Title	(Keynote Address) Materials Integration for Group IV Semiconductor CMOS
Author	Masataka Hirose (MIRAI-ASRC, AIST, Japan)
Page	pp. 1 - 2

K-2 (Time: 11:15 - 12:15)

Title	(Keynote Address) Challenges in development of Dielectric Films for Future DRAM, Flash and New Memory Devices
Author	U-In Chung (Samsung Electronics Co., Ltd., Republic of Korea)
Page	pp. 3 - 4