| Title | Opening |
| Author | TBA |
| Title | Oxidation of Germanium – What is different from Oxidation of Silicon ? |
| Author | Akira Toriumi (Univ. Tokyo, Japan) |
| Title | High Quality Ge Gate Stacks Technologies by Using Plasma Oxidation |
| Author | Shinichi Takagi, Rui Zhang, Mitsuru Takenaka (Univ. Tokyo, Japan) |
| Title | Formation and Characterization of Hybrid Nanodots Floating Gate for Optoelectronic Devices |
| Author | Seiichi Miyazaki, Katsunori Makihara (Nagoya Univ., Japan), Mitsuhisa Ikeda (Hiroshima Univ., Japan) |
| Title | Comparing Photoluminescence Measurements with Theoretical Predictions for Transition Energies in Ge Quantum Dot Structures |
| Author | I.A. Fischer, P. Tighineanu, K. Busch, M. Paul, M. Jetter, P. Michler, O. Kirfel, F. Oliveira, E. Rolseth, J. Schulze (Univ. Stuttgart, Germany) |