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24th International Conference on
Amorphous and Nanocrystalline Semiconductors (ICANS 24)

Session 5B1  Nano-Si Preparation II
Time: 9:00 - 10:20 Friday, August 26, 2011
Location: Room 2
Chair: Hajime Shirai (Saitama Univ., Japan)

5B1-1, ID 1196 (Time: 9:00 - 9:20)
TitleFabrication of Si Thin Films Using rf-PECVD with SiH4 and F2
Author*Sinae Kim, Junichi Hanna (Tokyo Inst. of Tech., Japan)
Pagep. 310

5B1-2, ID 1223 (Time: 9:20 - 9:40)
TitleThe Depression Effect of Hydrogen on the Mounded Surface Growth in Microcrystalline Silicon Film
Author*Fengzhen Liu, Hailong Zhang, Meifang Zhu, Yuqin Zhou, Jinlong Liu (Chinese Academy of Sciences, China)
Pagep. 311

5B1-3, ID 1134 (Time: 9:40 - 10:00)
TitleTailored Voltage Waveforms for the Deposition of Microcrystalline Silicon
Author*Erik V Johnson, Pierre-Alexandre Delattre, Jean-Paul Booth (Ecole Polytechnique, France)
Pagep. 312

5B1-4, ID 1179 (Time: 10:00 - 10:20)
TitleOn the Role of Atomic Hydrogen during Microcrystalline Silicon Thin-Film Deposition
Author*Aafke Bronneberg, Adriana Creatore (Eindhoven Univ. of Tech., Netherlands), Marinus van de Sanden (FOM Institute for Plasma Physics Rijnhuizen, Netherlands)
Pagep. 313