Title | Optimization of Heat Transition Layer in Infrared Laser Crystallization for High Performance Si Thin Film Transistors |
Author | *Sul Lee, Jun Hyeon Bae, Byung Gook Choi, Ki-tae Kim, Sung Ki Kim, Kwon-shik Park, JongUk Bae, Chang-Dong Kim, Myungchul Jun, YongKee Hwang, In-Jae Chung (LG Display, Republic of Korea) |
Page | p. 210 |
Title | Mechanism and Control of Crack Generation in Glass Substrates during Crystallization of a-Si Films by Flash Lamp Annealing |
Author | *Keisuke Ohdaira, Naohito Tomura, Shohei Ishii, Keisuke Sawada, Hideki Matsumura (JAIST, Japan) |
Page | p. 211 |
Title | Reduction in the Defect Density of Flash-Lamp-Crystallized Polycrystalline Silicon Films by Conventional Furnace Annealing |
Author | *Keisuke Sawada, Shohei Ishii, Naohito Tomura (JAIST, Japan), Keisuke Ohdaira (PRESTO, Japan Science and Technology Agency (JST), Japan), Hideki Matsumura (JAIST, Japan) |
Page | p. 212 |
Title | Preferential Grain Orientation in Laser-Crystallized Polycrystalline Silicon Thin Films |
Author | *Moshe Weizman, Carola Klimm, Norbert Nickel, Bernd Rech (Helmholtz-Zentrum Berlin für Materialien und Energie, Germany) |
Page | p. 213 |